S-ALD for next generation energy devices

SparkNano develops Roll-to-roll and Sheet-to-sheet equipment based on patented Spatial Atomic Layer Deposition (S-ALD) technology. S-ALD is a gas-phase thin-film deposition method used to apply highly uniform thin films of various functional materials at high deposition rates on large area substrates for a wide range of applications. This enables cost-effective, high throughput and large-area ALD improving performance, use of scarce materials in applications such as electrolysis, fuel cells, batteries and photovoltaics.